Etching Equipment - Company Ranking(34 companies in total)
Last Updated： Aggregation Period:Jul 15, 2026〜Aug 11, 2026
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Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| The RIE-10NR is a reactive ion etching device designed for high-precision etching of various silicon thin films such as Si, Poly-Si, SiO2, a... | - High-precision etching of various silicon thin films such as Si, Poly-Si, SiO₂, and SiN - Fabrication of semiconductor lasers - Defect ana... | ||
| 【Features】 <RIE-400iPC> ■Compatible with maximum Φ4” wafers ■Can efficiently and stably apply high RF power (over 2 kW), achieving good unif... | For more details, please refer to the PDF document or feel free to contact us. | ||
| The RIE-330iPC is a multi-wafer processing etching device for compound semiconductor processes that employs an inductively coupled plasma (I... | 【Application Examples】 Fabrication of GaN-based electronic devices and light-emitting devices For more details, please request materials... | ||
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- Featured Products
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Dry etching device RIE-10NR (parallel plate type RIE device)
- overview
- The RIE-10NR is a reactive ion etching device designed for high-precision etching of various silicon thin films such as Si, Poly-Si, SiO2, a...
- Application/Performance example
- - High-precision etching of various silicon thin films such as Si, Poly-Si, SiO₂, and SiN - Fabrication of semiconductor lasers - Defect ana...
ICP etching equipment RIE-800iPC/RIE-400iPC
- overview
- 【Features】 <RIE-400iPC> ■Compatible with maximum Φ4” wafers ■Can efficiently and stably apply high RF power (over 2 kW), achieving good unif...
- Application/Performance example
- For more details, please refer to the PDF document or feel free to contact us.
ICP etching equipment for compound semiconductor processes
- overview
- The RIE-330iPC is a multi-wafer processing etching device for compound semiconductor processes that employs an inductively coupled plasma (I...
- Application/Performance example
- 【Application Examples】 Fabrication of GaN-based electronic devices and light-emitting devices For more details, please request materials...
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