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Etching Equipment - Company Ranking(34 companies in total)

Last Updated: Aggregation Period:Sep 02, 2026〜Sep 29, 2026
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Company Name Featured Products
Product Image, Product Name, Price Range overview Application/Performance example
The VPE-4F is a XeF2 etching device primarily intended for etching the sacrificial layer (Si) during the formation of standalone devices in ... Etching of sacrificial layer (Si) during the formation of autonomous devices in the MEMS process.
The RIE-10NR is a reactive ion etching device designed for high-precision etching of various silicon thin films such as Si, Poly-Si, SiO2, a... - High-precision etching of various silicon thin films such as Si, Poly-Si, SiO₂, and SiN - Fabrication of semiconductor lasers - Defect ana...
【Features】 <RIE-400iPC> ■Compatible with maximum Φ4” wafers ■Can efficiently and stably apply high RF power (over 2 kW), achieving good unif... For more details, please refer to the PDF document or feel free to contact us.
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  1. Featured Products
    Dry etching equipment / XeF2 etching equipmentDry etching equipment / XeF2 etching equipment
    overview
    The VPE-4F is a XeF2 etching device primarily intended for etching the sacrificial layer (Si) during the formation of standalone devices in ...
    Application/Performance example
    Etching of sacrificial layer (Si) during the formation of autonomous devices in the MEMS process.
    Dry etching device RIE-10NR (parallel plate type RIE device)Dry etching device RIE-10NR (parallel plate type RIE device)
    overview
    The RIE-10NR is a reactive ion etching device designed for high-precision etching of various silicon thin films such as Si, Poly-Si, SiO2, a...
    Application/Performance example
    - High-precision etching of various silicon thin films such as Si, Poly-Si, SiO₂, and SiN - Fabrication of semiconductor lasers - Defect ana...
    ICP etching equipment RIE-800iPC/RIE-400iPCICP etching equipment RIE-800iPC/RIE-400iPC
    overview
    【Features】 <RIE-400iPC> ■Compatible with maximum Φ4” wafers ■Can efficiently and stably apply high RF power (over 2 kW), achieving good unif...
    Application/Performance example
    For more details, please refer to the PDF document or feel free to contact us.